Mr. Yariv Simovitch
System & Technology Architect at Applied Materials Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Oxides, Diffraction, Monochromatic aberrations, Point spread functions, Metrology, Calibration, Etching, Silicon, Semiconducting wafers, Overlay metrology

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