Dr. Yasin Ekinci
at Paul Scherrer Institut
SPIE Involvement:
Conference Program Committee | Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Author
Websites:
Publications (136)

Proceedings Article | 10 April 2024 Presentation
Myung Mo Sung, Hyeonseok Ji, Jaehyuk Lee, Jinho Ahn, Chang Gyoun Kim, Sangsul Lee, Yasin Ekinci, Prajith Karadan, Dimitrios Kazazis
Proceedings Volume PC12953, PC129530K (2024) https://doi.org/10.1117/12.3009753
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photoresist materials, Line width roughness, Synchrotron radiation, Monolayers, Solubility, Resistance, Reproducibility, Outgassing

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12953, PC129530P (2024) https://doi.org/10.1117/12.3010388
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Electron beam lithography, Diffraction gratings, Diffraction, Photoresist materials, Lithography, Synchrotrons, Reflection

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume 12955, 129552Y (2024) https://doi.org/10.1117/12.3010514
KEYWORDS: Image restoration, Temporal coherence, Extreme ultraviolet, Light sources and illumination, Image quality, Diffraction, Optical coherence, Scanning electron microscopy, Reconstruction algorithms, Photomasks

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550D (2024) https://doi.org/10.1117/12.3010875
KEYWORDS: Extreme ultraviolet, Reflectometry, Scatterometry, Grazing incidence, Diffraction, Diffraction gratings, Reflectivity, Overlay metrology

Proceedings Article | 9 April 2024 Presentation + Paper
Luong Nguyen Dang, Li-Ting Tseng, Anil Rajak, Thomas Gädda, Markus Laukkanen, Jagadish Salunke, Shima Moosakkani, Jyri Paulasaari, Juha Rantala, Michaela Vockenhuber, Dimitrios Kazazis, Yasin Ekinci
Proceedings Volume 12957, 129570I (2024) https://doi.org/10.1117/12.3014297
KEYWORDS: Electron beam lithography, Solubility, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Polymers, Line width roughness, Photoresist materials, Lithography, Spin on carbon materials

Showing 5 of 136 publications
Conference Committee Involvement (18)
UV and Higher Energy Photonics: From Materials to Applications 2024
18 August 2024 | San Diego, California, United States
UV and Higher Energy Photonics: From Materials to Applications 2023
20 August 2023 | San Diego, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
UV and Higher Energy Photonics: From Materials to Applications 2022
21 August 2022 | San Diego, California, United States
UV and Higher Energy Photonics: From Materials to Applications 2021
2 August 2021 | San Diego, California, United States