Dr. Yasmine A. Badr
PhD candidate at
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | March 28, 2017
JM3 Vol. 16 Issue 01
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Legal, Electron beam lithography, Germanium, Surface plasmons, Optical lithography, Double patterning technology, Directed self assembly

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Electron beam lithography, Surface plasmons, Optical lithography, Germanium, Manufacturing, Photomasks, Extreme ultraviolet, Directed self assembly, 193nm lithography

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Visualization, Annealing, Manufacturing, Photomasks, Directed self assembly, Semiconductor manufacturing, Optics manufacturing

SPIE Journal Paper | December 17, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Optical lithography, Double patterning technology, Diffusion, Extreme ultraviolet lithography, Standards development, Transistors, Binary data, Interfaces, Lithography, Machine learning

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Lithography, Lithium, Optical lithography, Manufacturing, Machine learning, Transistors, Double patterning technology, Binary data, Standards development, Design for manufacturability

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Etching, Metals, Silicon, Computer programming, Solids, Design for manufacturing, Photomasks, Extreme ultraviolet lithography, Double patterning technology

Showing 5 of 6 publications
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