Mr. Yasri Yudhistira
at GLOBALFOUNDRIES Singapore
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Wafer-level optics, Data modeling, Etching, Pattern recognition, Scanning electron microscopy, Optical proximity correction, Optical alignment, Computer aided design, Target recognition, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Reticles, Data modeling, Silicon, Light scattering, Control systems, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Superposition, Optical components, Lithography, Lithographic illumination, Diffractive optical elements, Image processing, Composites, Printing, Photomasks, Fiber optic illuminators

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