Mr. Yasuhiro Kishikawa Profile

Yasuhiro Kishikawa

Research Staff Member at Canon Inc

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 January 2009

Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch

Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai

JM3, Vol. 8, Issue 01, 013003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3059551

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

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Proceedings Article | 26 March 2007 Paper

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, Yuichi Iwasaki, Seiji Takeuchi, Minoru Yoshii, Tokuyuki Honda

Proceedings Volume 6520, 65203L (2007) https://doi.org/10.1117/12.711420

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Immersion lithography, Polymers, Interferometry, Lithography, Optical lithography, Optical simulations, Image resolution

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SPIE Journal Paper | 1 October 2006

Influence of resist blur on ultimate resolution of ArF immersion lithography

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

JM3, Vol. 5, Issue 04, 043004, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397018

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography

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Proceedings Article | 15 March 2006 Paper

What determines the ultimate resolution? The critical relationship between exposure tools and photoresists

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

Proceedings Volume 6154, 615422 (2006) https://doi.org/10.1117/12.656123

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Photoresist materials, Semiconducting wafers, Immersion lithography, Refractive index, Chemically amplified resists, Extreme ultraviolet lithography, Scanners

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Proceedings Article | 12 May 2005 Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 28 May 2004 Paper

ArF immersion lithography: critical optical issues

Tokuyuki Honda, Yasuhiro Kishikawa, Toshinobu Tokita, Hiroshi Ohsawa, Miyoko Kawashima, Akinori Ohkubo, Minoru Yoshii, Koji Uda, Akiyoshi Suzuki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534024

KEYWORDS: Semiconducting wafers, Immersion lithography, Photomasks, Diffraction, Water, Liquids, Interferometry, Refractive index, Glasses, Lithography

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Proceedings Article | 14 November 2003 Paper

Precise in-situ transmission measurement system at 157 nm

Seiji Takeuchi, Yasuhiro Kishikawa, Minoru Yoshii, Akiyoshi Suzuki

Proceedings Volume 5192, (2003) https://doi.org/10.1117/12.506614

KEYWORDS: Beam splitters, Polarization, Transmittance, Sensors, Reflection, Calcium, Reflectivity, Lithography, Excimer lasers, Pulsed laser operation

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Showing 5 of 7 publications

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