Mr. Yasuhiro Kishikawa
Research Staff Member at Canon Inc
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | January 1, 2009
JM3 Vol. 8 Issue 01
KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Image resolution, Interferometry, Photoresist materials, Optical simulations, Immersion lithography, Modulation transfer functions

SPIE Journal Paper | October 1, 2006
JM3 Vol. 5 Issue 04
KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Refractive index, Scanners, Diffusion, Interferometry, Photoresist materials, Extreme ultraviolet lithography, Immersion lithography, Modulation transfer functions, Semiconducting wafers, Chemically amplified resists

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Diffraction, Refractive index, Water, Glasses, Interferometry, Photomasks, Immersion lithography, Semiconducting wafers, Liquids

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Refractive index, Microfluidics, Polarization, Imaging systems, Water, Projection systems, Photomasks, Immersion lithography, Critical dimension metrology

Showing 5 of 7 publications
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