Mr. Yasuhiro Ohmura
at Nikon Corp
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Mirrors, Optical lithography, Wavefronts, Control systems, Deformable mirrors, Distortion, Projection systems, Performance modeling, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Semiconductors, Lithography, Light sources, Optical lithography, Atrial fibrillation, Lithographic illumination, Scanners, Manufacturing, Wavefronts, Control systems, Distortion, Signal processing, Immersion lithography, Optical alignment, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Atrial fibrillation, Sensors, Scanners, Manufacturing, Distortion, Semiconducting wafers, Overlay metrology, Fiber optic illuminators

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Switching, Imaging systems, Water, Deformable mirrors, Distortion, Immersion lithography, Lithographic lenses, Semiconducting wafers

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Point spread functions, Modulation, Imaging systems, Scanners, Distortion, Photomasks, Source mask optimization, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Monochromatic aberrations, Switching, Polarization, Glasses, Image processing, Wavefronts, Deformable mirrors, Critical dimension metrology, Semiconducting wafers, Standards development

Showing 5 of 24 publications
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