Mr. Yasushi Okubo Profile

Yasushi Okubo

at JEOL Ltd.

SPIE Involvement:

Author

Proceedings Article | 29 September 2010 Paper

Advanced binary film for 193nm lithography extension to sub-32-nm node

Osamu Nozawa, Hiroaki Shishido, Masahiro Hashimoto, Yasushi Ohkubo, Hideaki Mitsui

Proceedings Volume 7823, 78230K (2010) https://doi.org/10.1117/12.866006

KEYWORDS: Photomasks, Tantalum, Reflectivity, Critical dimension metrology, Silicon, Etching, Binary data, Oxides, Chromium, Scanning transmission electron microscopy

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Proceedings Article | 19 May 2008 Paper

Photomask technology for 32nm node and beyond

Ryugo Hikichi, Hiroyuki Ishii, Hidekazu Migita, Noriko Kakehi, Mochihiro Shimizu, Hideyoshi Takamizawa, Tsugumi Nagano, Masahiro Hashimoto, Hiroyuki Iwashita, Toshiyuki Suzuki, Morio Hosoya, Yasushi Ohkubo, Masao Ushida, Hideaki Mitsui

Proceedings Volume 7028, 702805 (2008) https://doi.org/10.1117/12.793014

KEYWORDS: Chromium, Photomasks, Etching, Binary data, Image processing, Photoresist processing, Photomask technology, Lithography, Multilayers, Absorbance

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Proceedings Article | 15 May 2007 Paper

Novel glass inspection method for advanced photomask blanks

Masaru Tanabe, Toshiharu Kikuchi, Masahiro Hashimoto, Yasushi Ohkubo

Proceedings Volume 6607, 66072H (2007) https://doi.org/10.1117/12.729000

KEYWORDS: Inspection, Transmittance, Semiconducting wafers, Photomasks, Glasses, Printing, Reflection, Defect detection, Luminescence, Quartz

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Proceedings Article | 3 May 2007 Paper

Birefringence variation of quartz substrates during mask process

Yasutaka Morikawa, Yasuhisa Kitahata, Toshifumi Yokoyama, Toshiharu Kikuchi, Atsushi Kawaguchi, Yasushi Ohkubo

Proceedings Volume 6533, 65331J (2007) https://doi.org/10.1117/12.736526

KEYWORDS: Birefringence, Photomasks, Pellicles, Quartz, Lithography, Semiconducting wafers, Thermal effects, Manufacturing, Standards development, Light sources

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part III

Yuuki Abe, Jumpei Morimoto, Toshifumi Yokoyama, Atsushi Kominato, Yasushi Ohkubo

Proceedings Volume 6349, 634935 (2006) https://doi.org/10.1117/12.692889

KEYWORDS: Etching, Chromium, Anisotropic etching, Quartz, Photomasks, Plasma, Phase shifts, Photoresist processing, Chlorine, Plasma etching

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 9 November 2005 Paper

A comprehensive reticle handling and storage approach for optimized fab yields

Atsushi Nobe, Hideaki Kawashima, Akinori Kurikawa, Hisashi Kasahara, Fumiko Ohta, Yasushi Okubo

Proceedings Volume 5992, 59924B (2005) https://doi.org/10.1117/12.632556

KEYWORDS: Reticles, Particles, Photomasks, Data storage, Contamination, Optical properties, Inspection, Polymethylmethacrylate, Adhesives, Air contamination

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Proceedings Article | 6 December 2004 Paper

Development of new chrome blanks for 65-nm node and beyond

Masahiro Hashimoto, Takeyuki Yamada, Minoru Sakamoto, Mutsumi Hara, Yasushi Ohkubo, Masao Ushida

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.580776

KEYWORDS: Etching, Reticles, Chromium, Image processing, Fabrication, Resolution enhancement technologies, Vestigial sideband modulation, Scanning electron microscopy, Photoresist processing, Photomasks

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Proceedings Article | 28 August 2003 Paper

CAR blanks performance for advanced reticle fabrication

Masahiro Hashimoto, Yasunori Yokoya, Takao Higuchi, Fumiko Ohta, Shouichi Kawashima, Yasushi Ohkubo

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504183

KEYWORDS: Reflectivity, Coating, Deep ultraviolet, Reticles, Critical dimension metrology, Line edge roughness, Tolerancing, Laser systems engineering, Optical lithography, Laser applications

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Proceedings Article | 28 August 2003 Paper

Development of attenuating PSM shifter for F₂ and high-transmission ArF lithography

Osamu Nozawa, Yuki Shiota, Hideaki Mitsui, Toshiyuki Suzuki, Yasushi Ohkubo, Masao Ushida, Satoshi Yusa, Toshiharu Nishimura, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504047

KEYWORDS: Transmittance, Etching, Dry etching, Chromium, Photomasks, Fluorine, Inspection, Phase shifts, Lithography, Plasma

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Proceedings Article | 27 December 2002 Paper

Improvement of NLD mask dry etching system for 100-nm-node technology

Yoshiyuki Tanaka, Nobuyuki Yoshioka, Noriyuki Harashima, Takaei Sasaki, Kiyoshi Kuwahara, Toshio Hayashi, Mutsumi Hara, Yasushi Ohkubo

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467914

KEYWORDS: Antennas, Etching, Dry etching, Photomasks, Plasma, Lithography, Photoresist processing, Control systems, Modulation

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Proceedings Article | 22 January 2001 Paper

Evaluation of loading effect of NLD dry etching: II

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410736

KEYWORDS: Etching, Dry etching, Plasma, Photoresist processing, Critical dimension metrology, Antennas, Optical proximity correction, Magnetism, Quartz, Semiconductors

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Proceedings Article | 22 January 2001 Paper

Development of MoSi-based halftone phase-shift blank and mask fabrication for ArF lithography (Photomask Japamn 2000 Best Presentation Award)

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410773

KEYWORDS: Photomasks, Lithography, Binary data, Scanning electron microscopy, Chromium, Laser irradiation, Inspection, Phase shifts, Halftones, Mask making

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Proceedings Article | 19 July 2000 Paper

Evaluation of loading effect of NLD dry etching

Takayuki Iwamatsu, Tatsuya Fujisawa, Koji Hiruta, Hiroaki Morimoto, Noriyuki Harashima, Takaei Sasaki, Mutsumi Hara, Kazuhide Yamashiro, Yasushi Okubo, Yoichi Takehana

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392060

KEYWORDS: Etching, Dry etching, Photomasks, Critical dimension metrology, Scanning electron microscopy, Mask making, Plasma, Photoresist processing, Plasma etching, Chromium

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Proceedings Article | 19 July 2000 Paper

Development of halftone phase-shift blank and mask fabrication for ArF lithography

Hideki Suda, Hideaki Mitsui, Osamu Nozawa, Hitoshi Ohtsuka, Megumi Takeuchi, Naoki Nishida, Yasushi Okubo, Masao Ushida

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392099

KEYWORDS: Photomasks, Lithography, Binary data, Halftones, Laser irradiation, Scanning electron microscopy, Mask making, Etching, Optical properties, Defect inspection

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