Yasushi Okubo
at Nihondenshi (Kabu);JEOL Ltd
SPIE Involvement:
Conference Program Committee | Conference Co-Chair | Author
Publications (19)

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Oxides, Etching, Silicon, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Tantalum, Binary data, Scanning transmission electron microscopy

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Multilayers, Etching, Image processing, Chromium, Photomasks, Absorbance, Photoresist processing, Photomask technology, Binary data

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Defect detection, Reflection, Quartz, Glasses, Luminescence, Inspection, Printing, Transmittance, Photomasks, Semiconducting wafers

Proceedings Article | 3 May 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Light sources, Birefringence, Quartz, Manufacturing, Pellicles, Thermal effects, Photomasks, Semiconducting wafers, Standards development

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Quartz, Chromium, Photomasks, Plasma etching, Chlorine, Photoresist processing, Anisotropic etching, Plasma, Phase shifts

Showing 5 of 19 publications
Conference Committee Involvement (6)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XIII
18 April 2006 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XII
13 April 2005 | Yokohama, Japan
Photomask and Next-Generation Lithography Mask Technology XI
14 April 2004 | Yokohama, Japan
Showing 5 of 6 published special sections
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