Yasushi Sakaida
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (16)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Etching, Polymers, Resistance, Process control, Photomasks, Absorbance, Wet etching, Semiconductor manufacturing, Semiconducting wafers, Adhesives, Tin

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Etching, Polymers, Image processing, Materials processing, Photomasks, Extreme ultraviolet lithography, Immersion lithography, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Silicon, Materials processing, Double patterning technology, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Diffusion, Amplifiers, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Industrial chemicals

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Sensors, Etching, Glasses, Silicon, Coating, Materials processing, Double patterning technology, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Ultraviolet radiation, Interfaces, Silicon, Resistance, Chemical vapor deposition, Double patterning technology, Thin film coatings, Semiconducting wafers, 193nm lithography

Showing 5 of 16 publications
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