Yasutaka Morikawa
Leader at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (69)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, SRAF, Tantalum

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Tolerancing

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Mirrors, Multilayers, Radon, Image processing, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Metals, Silicon, Transmittance, Photomasks, Excimer lasers, Double patterning technology, Optical proximity correction, Semiconducting wafers, Phase shifts

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Microscopes, Multilayers, Reflectivity, Image quality

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Multilayers, Image processing, Particles, Inspection, Reflectivity, Transmission electron microscopy, Photomasks, Extreme ultraviolet lithography, Neodymium, Mask cleaning

Showing 5 of 69 publications
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