Yasutaka Morikawa
Leader at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (69)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Photomasks, Line width roughness, Extreme ultraviolet, SRAF, Extreme ultraviolet lithography, Tantalum, Scanning electron microscopy, Chromium

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Printing, Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Visualization, Inspection, Tolerancing, Optical alignment

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Extreme ultraviolet, Mirrors, Extreme ultraviolet lithography, Photomasks, Multilayers, Transmission electron microscopy, Image processing, Photoresist processing, Scanning electron microscopy, Radon

Proceedings Article | 10 May 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Photomasks, Double patterning technology, Semiconducting wafers, Metals, Phase shifts, Optical proximity correction, Silicon, Excimer lasers, Transmittance

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Multilayers, Reflectivity, Microscopes, Image quality

Showing 5 of 69 publications
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