Yasutaka Morikawa
at Evolving Nano-process Infrastructure Development Ctr., Inc.
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Lithography, Lithographic illumination, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Tantalum, Semiconducting wafers

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Metrology, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Edge roughness, Defect inspection

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