Yasutaka Toyoda
at Hitachi Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Image processing, Inspection, Computer simulations, 3D modeling, Image analysis, Scanning electron microscopy, Image quality, Device simulation

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Surgery, Image segmentation, Image processing, Pattern recognition, Feature extraction, Scanning electron microscopy, Shape analysis, Statistical modeling

Proceedings Article | 25 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Metrology, Scanners, Image analysis, Optical fabrication, Scanning electron microscopy, Process control, Shape analysis, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Metals, Reliability, Photomasks, Optical proximity correction, Semiconducting wafers, Personal protective equipment

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metals, Error analysis, Inspection, Distortion, Scanning electron microscopy, Photomasks, Shape analysis, Semiconducting wafers, Overlay metrology, Defect inspection

Showing 5 of 13 publications
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