Mr. Yasutohi Ito
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Opacity, Quartz, Ions, Monte Carlo methods, Transmittance, Photomasks, Gallium, Binary data, 193nm lithography

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Opacity, Etching, Control systems, Atomic force microscopy, Photomasks, Computer aided design, Acoustics, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Imaging systems, Etching, Chromium, Control systems, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Microscopes, Metrology, Contamination, Chromium, Atomic force microscopy, 3D metrology, Photomasks, Atomic force microscope, Critical dimension metrology

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Carbon, Lithography, Image resolution, Control systems, Raman spectroscopy, Transmittance, Photomasks, Computer aided design, Surface conduction electron emitter displays, 193nm lithography

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Imaging systems, Opacity, Image processing, Ions, Printing, Transmittance, Photomasks, Binary data, Surface conduction electron emitter displays

Showing 5 of 6 publications
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