We fabricated indium tin oxide (ITO) thin films on nanoimprinted glass substrates using pulsed laser deposition (PLD).
The nanoimprinted glass substrate was prepared by thermal nanoimprint using an atomically stepped sapphire (α-Al<sub>2</sub>O<sub>3</sub>
single crystal) mold. Two kinds of sapphire molds were employed, one with a single step about 0.2 nm high and the
other with a bunched step about 2 nm high. The surface morphology of the stepped sapphire mold was successfully
transferred to the glass surface in an atomic scale. The nanoimprinted glass had a regular nanostepped pattern; one had a
step height of about 0.2 nm and step separation of about 100 nm, the other had a step height of about 2 nm and step
separation of about 1 μm. The ITO films were deposited at room-temperature (RT) or 200°C on the nanoimprinted glass
substrates and on the non-patterned commercial glass for comparison. The ITO films deposited at RT were post-annealed
for further crystallization. The surface of the ITO thin films deposited on the nanoimprinted glass well reflected the
nanopattern of the glass substrate surface. Preferential crystalline orientation of the ITO thin films was achieved on the
nanoimprinted glass substrates. The resistivity of ITO thin films deposited on the nanoimprinted glass was lower than
that on the commercial glass, which was probably due to the higher crystal orientation of the films grown on the
nanoimprinted glass surfaces.