Yasuyuki Kushida
at Fujitsu Ltd
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 1 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffractive optical elements, Etching, Chromium, Process control, Photomasks, Line width roughness, Cadmium sulfide, SRAF, Mask making, Photoresist processing

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Opacity, Dry etching, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Photoresist processing, Defect inspection

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Thin films, Lithography, Reticles, Etching, Dry etching, Chromium, Control systems, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 19 July 2000 Paper
Proc. SPIE. 4066, Photomask and Next-Generation Lithography Mask Technology VII
KEYWORDS: Etching, Quartz, Ions, Coating, Chromium, Photomasks, Mask making, Critical dimension metrology, Chlorine, Photoresist processing

Proceedings Article | 26 July 1999 Paper
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Electron beams, Optical lithography, Quartz, Coating, Manufacturing, Mask making, Photoresist processing, Coating equipment, Chemically amplified resists

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top