Prof. Yayi Wei
Professor at IMECAS
SPIE Involvement:
Author
Publications (59)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Source mask optimization, Reconstruction algorithms, Lithography, Computer simulations, Imaging systems, Lithographic illumination, Compressed sensing, Computational lithography, Optical lithography

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Computer programming, Calibration, Digital imaging, Optical sensors, Cameras, Wavelet transforms, Optical encoders, Fringe analysis, CMOS sensors, Fourier transforms

SPIE Journal Paper | 18 November 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Lithography, Model-based design, Optimization (mathematics), Neural networks, Data modeling, Machine learning, Photomasks, Mathematical modeling, Ultrafast phenomena, Source mask optimization

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Photomasks, Extreme ultraviolet, Lithography, Deep ultraviolet, Reflectivity, Manufacturing, Polishing, Plasma etching, Optical proximity correction, Extreme ultraviolet lithography

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Lithography, Lithographic illumination, Fiber optic illuminators, Numerical simulations, Deep ultraviolet, Absorption, Reflectivity, Surface roughness

Showing 5 of 59 publications
Conference Committee Involvement (1)
Design-Technology Co-optimization XV
21 February 2021 | San Jose, California, United States
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