Dr. Ye Chen
at Zhejiang Univ
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 12, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Logic, Manufacturing, Printing, Very large scale integration, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Optics manufacturing, Model-based design

PROCEEDINGS ARTICLE | November 27, 2007
Proc. SPIE. 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography
KEYWORDS: Lithography, Data modeling, Computer simulations, 3D modeling, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Calibration, Manufacturing, Bridges, Optical proximity correction, Convolution, Semiconducting wafers, Optics manufacturing, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 27, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Detection and tracking algorithms, Photomasks, Optical proximity correction, Convolution, Californium, Model-based design, Process modeling

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