Dr. Ye Feng
at
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Wafer-level optics, Semiconductors, Etching, Silicon, Photoresist materials, Process control, Finite element methods, Dysprosium, Critical dimension metrology, Semiconducting wafers

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