Yee Mei Foong
Engineer at
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Calibration, Source mask optimization, Critical dimension metrology

PROCEEDINGS ARTICLE | September 28, 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Image processing, Scanners, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Superposition, Lithography, Data modeling, Image processing, 3D modeling, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Algorithm development, Optimization (mathematics), Performance modeling

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Lithographic illumination, Sensors, Etching, Metals, Electroluminescence, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 18, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Data modeling, Calibration, 3D modeling, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling

Showing 5 of 19 publications
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