Yee Mei Foong
Engineer at
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 20 March 2019
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Calibration, Error analysis, Diffusion, 3D modeling, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling, Process modeling, Photo decomposable quencher

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Calibration, Source mask optimization, Critical dimension metrology

Proceedings Article | 28 September 2017
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Image processing, Scanners, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Photovoltaics, Logic, Optical lithography, Lithographic illumination, Sensors, Etching, Metals, Electroluminescence, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 15 March 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Superposition, Lithography, Data modeling, Image processing, 3D modeling, Photomasks, Source mask optimization, Computational lithography, Optical proximity correction, Nanoimprint lithography, Algorithm development, Optimization (mathematics), Performance modeling

Showing 5 of 20 publications
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