Yee Mei Foong
Engineer
SPIE Involvement:
Author
Publications (21)

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Modeling, Lithography, Optical lithography, Photomasks, Optical proximity correction, Critical dimension metrology, Tolerancing, Model-based design, Process modeling, 193nm lithography

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Calibration, Error analysis, Diffusion, 3D modeling, SRAF, Photoresist processing, Semiconducting wafers, Performance modeling, Process modeling, Photo decomposable quencher

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Calibration, Source mask optimization, Critical dimension metrology

Proceedings Article | 28 September 2017 Paper
Proc. SPIE. 10446, 33rd European Mask and Lithography Conference

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Wafer-level optics, Metrology, Data modeling, Calibration, Image processing, Scanners, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 21 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top