Yen-Jen Chen
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Reticles, Metrology, Scanners, Extreme ultraviolet, High volume manufacturing, Optical alignment, Optimization (mathematics), Semiconducting wafers, HVAC controls, Overlay metrology

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Diffraction, Reticles, Metrology, Calibration, Scanners, Process control, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Near infrared, Sensors, Scanners, Aluminum, Optical alignment, Laser beam diagnostics

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Diffraction, Metrology, Scanners, Error analysis, Control systems, Time metrology, Process control, High volume manufacturing, Critical dimension metrology, Forward error correction, Semiconducting wafers

Proceedings Article | 8 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: MATLAB, Metrology, Scanners, Process control, Semiconductor manufacturing, High volume manufacturing, Manganese, Data centers, Semiconducting wafers, Statistical modeling, Overlay metrology

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