Prof. Yeonah Shim
Nano Photo Specialist at Dongbu HiTek Co Ltd
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Logic, Optical lithography, Image processing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Overlay metrology, Resolution enhancement technologies

Proceedings Article | 27 May 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Computer simulations, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Semiconductors, Metals, Scanning electron microscopy, Design for manufacturing, Transistors, Optical proximity correction, Semiconducting wafers, Photomask technology, Resolution enhancement technologies, Current controlled current source

Proceedings Article | 23 September 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image processing, Scanners, Computer simulations, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Defect detection, Detection and tracking algorithms, Databases, Scanning electron microscopy, Bridges, Design for manufacturing, Optical proximity correction, Model-based design, Fuzzy logic

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Silicon, Manufacturing, Design for manufacturing, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers, Yield improvement, Wafer manufacturing, Design for manufacturability

Showing 5 of 13 publications
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