Dr. Yeong-Uk Ko Profile

Dr. Yeong-Uk Ko

Application Scientist

SPIE Involvement:

Author

Profile Summary

2007 to 2008
ReVera, Inc. (Semiconductor Tool Vendor) San Jose, CA
Senior Application Technologist
1) Tool development validation by interaction with engineering and research team (H/W, S/W)
2) Customer process support with thin film thickness, N dose, atomic composition and zMAX (centroid of N profile) film metrology and evaluation with XPS tool

2004 to 2006
Fab Solutions, Inc. (Semiconductor Tool Vendor) Tokyo, Japan
Research Scientist/Technical Marketing Staff

1999 to 2004
University of Tennessee, Electron Microscope Facility, Knoxville, TN
Sr. Research Scientist (with Prof. David Joy)

1988 to 1999
Korea Research Institute of Standards and Science, Daejon, Korea
Sr. Research Scientist, Project Manager

Publications (20)

Proceedings Article | 2 April 2014 Paper

Paper

Metrology of white light interferometer for TSV processing

Padraig Timoney, Yeong-Uk Ko, Daniel Fisher, Cheng Kuan Lu, Yudesh Ramnath, Alok Vaid, Sarasvathi Thangaraju, Daniel Smith, Himani Kamineni, Dingyou Zhang, Wonwoo Kim, Ramakanth Alapati, Jonathan Peak, Hemant Amin, Holly Edmunson, Joe Race, Brennan Peterson, Tim Johnson

Proceedings Volume 9050, 90500F (2014) https://doi.org/10.1117/12.2047383

KEYWORDS: Copper, Semiconducting wafers, Interferometers, Metrology, Chemical mechanical planarization, Etching, Optical testing, Critical dimension metrology, Plating, Scanning electron microscopy

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Proceedings Article | 6 April 2007 Paper

Paper

CD measurement in flash memory using substrate current technology

Yeong-Uk Ko, Keizo Yamada, Takeo Ushiki

Proceedings Volume 6518, 65182T (2007) https://doi.org/10.1117/12.712477

KEYWORDS: Capacitance, Resistance, Signal processing, Signal analyzers, Semiconductors, Inspection, Signal detection, Manufacturing, Sensors, Measurement devices

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Proceedings Article | 24 March 2006 Paper

Paper

Modeling of substrate current measurement and charge transfer in insulators

Yeong-Uk Ko, Keizo Yamada, Takeo Ushiki, Robert Newcomb

Proceedings Volume 6152, 615230 (2006) https://doi.org/10.1117/12.656491

KEYWORDS: Electrons, Interfaces, Monte Carlo methods, Dielectrics, Thin films, Image processing, Oxides, Device simulation, Semiconductors, Scattering

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Proceedings Article | 10 May 2005 Paper

Paper

Developing an understanding of electron beam imaging of deep contact hole structures using Monte Carlo and spatial charge distribution simulations

Neal Sullivan, Byoung Lee, Yeong-Uk Ko

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601521

KEYWORDS: Monte Carlo methods, Silica, Scanning electron microscopy, Computer simulations, Selenium, Imaging systems, Electron beams, Optical simulations, Semiconducting wafers, Statistical modeling

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Proceedings Article | 2 June 2003 Paper

Paper

Simulation of repairing thin-film phase defect in masks for EUV lithography

Yeong-Uk Ko, David Joy, Scott Hector, Bing Lu

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485014

KEYWORDS: Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electrons, Electron beams, Thin films, Gaussian beams, Diffusion, Radiation effects, Extreme ultraviolet

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Proceedings Article | 16 July 2002 Paper

Paper

Simulation of imaging in projection microscope using multi-beam probe

Yeong-Uk Ko, David Joy

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473497

KEYWORDS: Electrons, Microscopes, Microelectromechanical systems, Mirrors, Monte Carlo methods, Ultraviolet radiation, Optical simulations, Photons, Chemical analysis, Inspection

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Proceedings Article | 22 August 2001 Paper

Paper

Secondary-electron image profiles using bias voltage technique in deep contact hole

Yeong-Uk Ko, David Joy, Neal Sullivan, Martin Mastovich

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436786

KEYWORDS: Selenium, Monte Carlo methods, Oxides, Semiconducting wafers, Image enhancement, Electron beams, Autoregressive models, Image processing, Semiconductors, Fabrication

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Proceedings Article | 22 August 2001 Paper

Paper

Monte Carlo model of charging in resists in e-beam lithography

Yeong-Uk Ko, David Joy

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436751

KEYWORDS: Electrons, Electron beam lithography, Monte Carlo methods, Electron beams, Manufacturing, Semiconductor manufacturing, Semiconductors, Control systems, Photomasks, Mask making

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Proceedings Article | 2 June 2000 Paper

Paper

Metrics of resolution and performance for CD-SEMs

David Joy, Yeong-Uk Ko, Justin Hwu

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386444

KEYWORDS: Image resolution, Interference (communication), Signal to noise ratio, Spatial resolution, Scanning electron microscopy, Image analysis, Image enhancement, Image transmission, Microscopes, Electron microscopes

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Proceedings Article | 2 June 2000 Paper

Paper

Monte Carlo model of charging in resists in e-beam lithography

Yeong-Uk Ko, Justin Hwu, David Joy

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386526

KEYWORDS: Electrons, Electron beam lithography, Monte Carlo methods, Electron beams, Manufacturing, Semiconductor manufacturing, Semiconductors, Control systems, Photomasks, Lithography

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Proceedings Article | 2 June 2000 Paper

Paper

Computer modeling of charging-induced electron beam deflection in electron beam lithography

Justin Hwu, Yeong-Uk Ko, David Joy

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386477

KEYWORDS: Electron beams, Optical simulations, Computer simulations, Electron beam lithography, Electrodes, Monte Carlo methods, Mathematical modeling, Data modeling, Glasses, Computer programming

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Proceedings Article | 14 June 1999 Paper

Paper

Precision improvement in diffraction measurement for the one-dimensional grating period

Beomhoan O, Won Young Song, Byong Chon Park, Yeong-Uk Ko

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350788

KEYWORDS: Diffraction gratings, Diffraction, Calibration, CCD cameras, Laser development, Metrology, Error analysis, Imaging systems, Collimation, Manufacturing

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Proceedings Article | 14 June 1999 Paper

Paper

Monte Carlo simulation of charging effects in linewidth metrology: II. On insulator substrate

Yeong-Uk Ko, Myung-Sai Chung

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350851

KEYWORDS: Silicon, Monte Carlo methods, Metrology, Scanning electron microscopy, Polymethylmethacrylate, Selenium, Electron microscopes, Semiconductors, Dielectrics, Resistance

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Proceedings Article | 8 June 1998 Paper

Paper

Influence of various factors on charging effects in linewidth metrology

Yeong-Uk Ko

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308787

KEYWORDS: Selenium, Monte Carlo methods, Lawrencium, Metrology, Scanning electron microscopy, Electron microscopes, Semiconductors, Electroluminescence, Semiconducting wafers, Electron beams

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Proceedings Article | 8 June 1998 Paper

Paper

Precision improvement for the calibration of submicron dimension reference for electron-beam metrology system

Beomhoan O, Byong Chon Park, Yeong-Uk Ko

Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308767

KEYWORDS: Diffraction gratings, Calibration, Diffraction, Metrology, Semiconductors, Laser development, Manufacturing, Computing systems, Standards development, Electron beams

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Proceedings Article | 7 July 1997 Paper

Paper

Monte Carlo simulation of charging effects on linewidth metrology

Yeong-Uk Ko

Proceedings Volume 3050, (1997) https://doi.org/10.1117/12.275943

KEYWORDS: Monte Carlo methods, Metrology, Selenium, Scanning electron microscopy, Polymethylmethacrylate, Quantum efficiency, Electron microscopes, Silicon, Semiconducting wafers, Shape analysis

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Proceedings Article | 21 May 1996 Paper

Paper

Linewidth measurement of wafers using SEM and its uncertainty evaluation

Yeong-Uk Ko, TaeBong Eom, Ki-Hong Kim, Seung-Woo Kim

Proceedings Volume 2725, (1996) https://doi.org/10.1117/12.240080

KEYWORDS: Scanning electron microscopy, Interferometers, Electron beams, Calibration, Semiconducting wafers, Standards development, Statistical analysis, Electron microscopes, Semiconductors, Image resolution

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Proceedings Article | 10 December 1993 Paper

Paper

Holographic fringe interpretation by FFT and carrier-fringe method

Yeong-Uk Ko, Chu-Shik Kang, Myung-Sai Chung, Young Kwon

Proceedings Volume 2003, (1993) https://doi.org/10.1117/12.165457

KEYWORDS: Fringe analysis, Holography, Modulation, Time metrology, Interferometry, Silicon, Semiconducting wafers, Holographic interferometers, Digital image processing, Mirrors

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Proceedings Article | 1 June 1992 Paper

Paper

Scanning electron microscope system for linewidth measurement of IC

Cheon Eom, TaeBong Eom, Yeong-Uk Ko, Myung-Sai Chung

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59784

KEYWORDS: Scanning electron microscopy, Electron beams, Interferometers, Electron microscopes, Monte Carlo methods, Image resolution, Calibration, Integrated circuits, Sensors, Distortion

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Proceedings Article | 1 December 1991 Paper

Paper

Measurement of thermal deformation of square plate by using holographic interferometry

Dae Kang, Young Kwon, Yeong-Uk Ko

Proceedings Volume 1554, (1991) https://doi.org/10.1117/12.57483

KEYWORDS: Holographic interferometry, Phase shifting, Holography, Fringe analysis, Mechanics, Nondestructive evaluation, Beam splitters, Mirrors, Ferroelectric materials, Composites

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Showing 5 of 20 publications

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