Dr. Yeong-Uk Ko
Application Scientist
SPIE Involvement:
Profile Summary

2007 to 2008
ReVera, Inc. (Semiconductor Tool Vendor) San Jose, CA
Senior Application Technologist
1) Tool development validation by interaction with engineering and research team (H/W, S/W)
2) Customer process support with thin film thickness, N dose, atomic composition and zMAX (centroid of N profile) film metrology and evaluation with XPS tool

2004 to 2006
Fab Solutions, Inc. (Semiconductor Tool Vendor) Tokyo, Japan
Research Scientist/Technical Marketing Staff

1999 to 2004
University of Tennessee, Electron Microscope Facility, Knoxville, TN
Sr. Research Scientist (with Prof. David Joy)

1988 to 1999
Korea Research Institute of Standards and Science, Daejon, Korea
Sr. Research Scientist, Project Manager
Publications (20)

Proceedings Article | 2 April 2014 Paper
Padraig Timoney, Yeong-Uk Ko, Daniel Fisher, Cheng Kuan Lu, Yudesh Ramnath, Alok Vaid, Sarasvathi Thangaraju, Daniel Smith, Himani Kamineni, Dingyou Zhang, Wonwoo Kim, Ramakanth Alapati, Jonathan Peak, Hemant Amin, Holly Edmunson, Joe Race, Brennan Peterson, Tim Johnson
Proceedings Volume 9050, 90500F (2014) https://doi.org/10.1117/12.2047383
KEYWORDS: Copper, Semiconducting wafers, Interferometers, Metrology, Chemical mechanical planarization, Etching, Optical testing, Critical dimension metrology, Plating, Scanning electron microscopy

Proceedings Article | 6 April 2007 Paper
Yeong-Uk Ko, Keizo Yamada, Takeo Ushiki
Proceedings Volume 6518, 65182T (2007) https://doi.org/10.1117/12.712477
KEYWORDS: Capacitance, Resistance, Signal processing, Signal analyzers, Semiconductors, Inspection, Signal detection, Manufacturing, Sensors, Measurement devices

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 615230 (2006) https://doi.org/10.1117/12.656491
KEYWORDS: Electrons, Interfaces, Monte Carlo methods, Dielectrics, Thin films, Image processing, Oxides, Device simulation, Semiconductors, Scattering

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601521
KEYWORDS: Monte Carlo methods, Silica, Scanning electron microscopy, Computer simulations, Selenium, Imaging systems, Electron beams, Optical simulations, Semiconducting wafers, Statistical modeling

Proceedings Article | 2 June 2003 Paper
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485014
KEYWORDS: Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electrons, Electron beams, Thin films, Gaussian beams, Diffusion, Radiation effects, Extreme ultraviolet

Showing 5 of 20 publications
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