Dr. Yezheng Tao
at Univ of California San Diego
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Metrology, Laser energy, Ions, Nd:YAG lasers, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Carbon dioxide, Nd:YAG lasers, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Laser beam diagnostics, Pulsed laser operation, Plasma, Tin, Absorption

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Spectroscopy, Ions, Silicon, Diagnostics, Laser ablation, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Optical spheres, Plasmas, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Laser beam diagnostics, Performance modeling, Temperature metrology, Tin, Absorption

PROCEEDINGS ARTICLE | September 13, 2007
Proc. SPIE. 6703, Ultrafast X-Ray Sources and Detectors
KEYWORDS: Foam, Laser energy, Plasmas, Solids, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Tin, Absorption

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Argon, Ions, Silicon, Silicon films, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Pulsed laser operation, Plasma, Tin

Showing 5 of 6 publications
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