CONFERENCE PROCEEDINGS
Advanced Search
Yi Chou Chen
at United Microelectronics Corp
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 13 March 2012 Paper
Influence of SRAF size on main feature CD variation on advanced node
Wei Cyuan Lo, Yi Chou Chen, Yung Feng Cheng, Ming Jui Chen
Proceedings Volume 8326, 83262K (2012) https://doi.org/10.1117/12.917989
KEYWORDS: SRAF, Critical dimension metrology, Photomasks, Semiconducting wafers, Printing, Computer simulations, Lithography, Tolerancing, Diffractive optical elements, 3D modeling
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top