Dr. Yi-Hsing Peng
Senior Product Engineer at ASML
SPIE Involvement:
Publications (6)

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508
KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11609, 1160916 (2021) https://doi.org/10.1117/12.2584767
KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

Proceedings Article | 20 March 2018 Presentation
Will Conley, Yi-Hsing Peng, Xiaolong Zhang, Stephen Hsu, Raphael La Greca
Proceedings Volume 10587, 105870E (2018) https://doi.org/10.1117/12.2299319
KEYWORDS: Light sources, Lithography, Manufacturing, Yield improvement, Deep ultraviolet, Scanners, Semiconducting wafers

Proceedings Article | 4 October 2016 Paper
Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

Proceedings Article | 25 March 2016 Paper
Proceedings Volume 9778, 97780W (2016) https://doi.org/10.1117/12.2221894
KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Logic, Image processing, Process control, Electron microscopes, Tolerancing, Distance measurement, Lithography, Finite element methods, Calibration

Showing 5 of 6 publications
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