Yi-Nan Shih
at Yuan Ze Univ
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Optical lithography, Deep ultraviolet, Computer simulations, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Optical scanning systems, Semiconducting wafers, Phase shifts

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