Dr. Yi-Sha Ku
Senior Principal Researcher at Industrial Technology Research Institute
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
optical metrology , overlay , modeling and algorithm , advanced lithography , measurement standard , 3D interconnect
Profile Summary

Interests: Metrology technologies, modeling, algorithm and applications for advanced lithography and manufacturing.

Inventor of in-chip overlay metrology, which has been adopted worldwide and are regarded as essential for the most advanced semiconductor processes. Evaluated optimal printing parameters and established appropriate methodologies, demonstrated the effectiveness on 45/55/65 nm node production wafer at TSMC.

Lead metrology-process integration in ITRI-TSMC-Nanometrics joint develop project of in-chip overlay metrology. Developed 2D/3D image formation model to optimize the overlay target design for specific process layers. Developed image asymmetric algorithm to determine overlay with nanometer sensitivity.

Developed optical metrology for advanced manufacturing industry at ITRI. Collaborated on overlay metrology with TSMC/IBM/AMD/Nanometrics, established effective performance metrics.

Managed broadband spectral reflectometry research and applications for determining high aspect ratio TSV (Through Silicon Vias) depth and bottom shape. Enabled 3D interconnect metrology market penetration and new system sales.




Publications (37)

Proceedings Article | 20 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Diffraction, Metrology, Sensors, Laser scattering, CCD cameras, Scatterometry, Extreme ultraviolet, Charge-coupled devices, CCD image sensors, Diffraction gratings

SPIE Journal Paper | 24 February 2018
JM3 Vol. 17 Issue 01
KEYWORDS: Diffraction, Diffraction gratings, Extreme ultraviolet, Sensors, Charge-coupled devices, CCD cameras, Laser scattering, CCD image sensors, Scatterometry, Scanning electron microscopy

Proceedings Article | 20 August 2015 Paper
Proc. SPIE. 9556, Nanoengineering: Fabrication, Properties, Optics, and Devices XII
KEYWORDS: Diffraction, Mirrors, Light sources, Metrology, Databases, CCD cameras, 3D metrology, Extreme ultraviolet, Diffraction gratings, Algorithms

Proceedings Article | 22 June 2015 Paper
Proc. SPIE. 9525, Optical Measurement Systems for Industrial Inspection IX
KEYWORDS: Wafer-level optics, Mirrors, Fringe analysis, Reflection, Calibration, Error analysis, LCDs, Image sensors, Sapphire, Semiconducting wafers

SPIE Journal Paper | 25 March 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Metrology, Inspection, 3D metrology, Process control, Integrated circuits, 3D modeling, Manufacturing, Roads, Standards development, Control systems

Showing 5 of 37 publications
Conference Committee Involvement (12)
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIII
25 February 2019 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXII
26 February 2018 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXI
27 February 2017 | San Jose, California, United States
Showing 5 of 12 Conference Committees
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