Dr. Yi Yi
Research Associate at Cornell Univ
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Silicon, Coating, Chemistry, Manufacturing, Inspection, Fourier transforms, Photoresist materials, Semiconducting wafers, Defect inspection

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Magnesium, Optical lithography, Polymers, Glasses, Molecules, Photoresist materials, Extreme ultraviolet lithography, Line edge roughness, Photoresist developing

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Electron beam lithography, Transparency, Polymers, Diffusion, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Absorption

Proceedings Article | 29 March 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Carbon, Lithography, Electron beam lithography, Polymers, Scanning electron microscopy, Chromophores, Line edge roughness, Fluorine, Absorption, Chemically amplified resists

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