Dr. Yi Zou
Senior Project Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (22)

Proceedings Article | 18 March 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Metrology, Logic, Optical lithography, Etching, Scanners, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Immersion lithography, Stochastic processes, Personal protective equipment

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Optical lithography, Polymethylmethacrylate, Atrial fibrillation, Roentgenium, Etching, Polymers, Molecules, Computer simulations, Monte Carlo methods, Directed self assembly

Proceedings Article | 28 March 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Detection and tracking algorithms, Deep ultraviolet, Etching, Computer simulations, Printing, Monte Carlo methods, Directed self assembly, Optical proximity correction, Optimization (mathematics)

Proceedings Article | 18 March 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Data modeling, Calibration, 3D modeling, Data processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Lithography, Metrology, Data modeling, Deep ultraviolet, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

Showing 5 of 22 publications
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