Yifei Lu
at Shanghai Integrated Circuit Research & Development
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Image processing, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

Proceedings Article | 17 May 2019 Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Performance modeling

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