Yijie Pan
at Zhejiang Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical proximity correction, Double patterning technology, Model-based design, Photomasks, Logic, Critical dimension metrology, Optics manufacturing, Printing, Manufacturing, Very large scale integration

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