This paper describes a novel remote plasma sputtering technique for depositing optical thin films. This technology is
based on generating intensive plasma remotely from the target and then magnetically steering the plasma to the target to
realize the sputter deposition. It overcomes several of inherent limitations in conventional sputtering techniques and
realizes the fully uniform erosion over the surface of the target and less target poison. This allows a uniform reaction in
the plasma phase when performing reactive sputtering, leading to the formation and deposition of material with a
uniform stoichiometry and gives pseudo-independence of target current and voltage. This pseudo-independence offers a
great deal of flexibility with regard to the control of growth conditions and film properties, the benefits include control of
stress, very low deposition rates for ultra thin films. By remote reactive sputtering, dense metal-oxide optical thin films
(SiO2, Ta2O5, Nb2O5) with a high deposition rate, excellent optical properties are achieved. High process stability shows
an excellent time terminating accuracy for multilayer coating thickness control. Typically, thin film thickness control to
<±1% is accomplished simply using time. The multilayer coating, including anti-reflection, dichroic mirror and 2μm
laser mirrors are presented.
The expanding field of LD-pumped solid state lasers forms an extraordinary challenge for developing the optical coatings. Optical thin films for LD-pumped Nd:YVO4/LBO blue laser at 457nm was presented in this paper based on lower gain laser line action theory, including spectral beam dividers and doubling antireflecting multilayer coatings. To achieve 914nm laser action and 457nm blue light high output power, the coating specifications of laser resonator was analyzed. The transmittance/reflectance spectrum request was effectively separated by adopting high tuned radio stack, simultaneously the spectrum request was reasonably distributed on the two resonator facet reflectivity for restrain the other laser lines such as 1064nm and 1342nm. The dielectric high reflective laser mirror and antireflecting coatings for 457nm laser were manufactured by double ion beam sputtering technique, which is controlled by a time-power monitoring. Using type-I critical phase-matching LBO crystal, 457nm blue laser is obtained by 914nm intracavity frequency doubling. The maximum laser output power of 1.5W is obtained when incident pump laser of 15W is used.
A Nd: YAG laser has longitudinally pumped by a fiber coupling 20 W laser diode array with emission wavelength at 808nm in a three folded cavity configuration. After a 150 μm thickness etalon was inserted into the cavity, the 1112nm fundamental laser operation was obtained, and then intracavity-frequency-doubling with a LBO crystal produced 1.41W of stable output at 556nm.
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