Dr. Yiming Gu
Photolithograpy Engineer at Texas Instruments Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 March 2008
Proc. SPIE. 6925, Design for Manufacturability through Design-Process Integration II
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Image segmentation, Manufacturing, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Cadmium, Etching, Silicon, Transistors, Optical proximity correction, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers, Plasma

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Logic, Cadmium, Etching, Scanning electron microscopy, Line width roughness, Transistors, Optical proximity correction, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 24 May 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Antireflective coatings, Reticles, Calibration, Metals, Dielectrics, Coating, Manufacturing, Reflectivity, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Optical lithography, Deep ultraviolet, Ions, Silicon, Manufacturing, Ion implantation, Photoresist processing, Semiconducting wafers, Tolerancing, Absorption

Showing 5 of 9 publications
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