Ying Chen
Student at Institute of Microelectronics
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 18 November 2019
JM3 Vol. 18 Issue 04
KEYWORDS: Lithography, Model-based design, Optimization (mathematics), Neural networks, Data modeling, Machine learning, Photomasks, Mathematical modeling, Ultrafast phenomena, Source mask optimization

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Feature extraction, Photomasks, Machine learning, Source mask optimization, Optical proximity correction, Optimization (mathematics)

Proceedings Article | 20 March 2018
Proc. SPIE. 10588, Design-Process-Technology Co-optimization for Manufacturability XII
KEYWORDS: Lithography, Image processing, Computer simulations, Image analysis, Image quality, Data processing, Microelectronics, Double patterning technology, Optics manufacturing, New and emerging technologies

Proceedings Article | 4 April 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Logic, Optical lithography, Metals, Manufacturing, Microelectronics, Photomasks, Double patterning technology, Immersion lithography, Source mask optimization, 193nm lithography

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Photovoltaics, Optical lithography, Metals, Image processing, Solar cells, Electroluminescence, Photomasks, Source mask optimization, Molybdenum, Optimization (mathematics), Process modeling, Resolution enhancement technologies, Lead

Showing 5 of 6 publications
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