Dr. Ying Li
Software Developer at Luminescent Technologies
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Deep ultraviolet, Inspection, Image analysis, Atomic force microscopy, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Double positive medium

Proceedings Article | 1 October 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Diffraction, Multilayers, Finite-difference time-domain method, Contamination, Calibration, 3D modeling, Photomasks, Extreme ultraviolet, Critical dimension metrology, Double positive medium

Proceedings Article | 20 September 2013 Paper
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Carbon, Reflectors, Multilayers, Calibration, Atomic force microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Semiconducting wafers, Double positive medium

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Data modeling, Calibration, Inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

Proceedings Article | 1 April 2013 Paper
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Inspection, Transmission electron microscopy, Printing, Software development, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium

Showing 5 of 16 publications
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