Dr. Ying Li
Software Developer at Luminescent Technologies
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Extreme ultraviolet, Photomasks, Scanning electron microscopy, Inspection, Atomic force microscopy, Double positive medium, Semiconducting wafers, Metrology, Image analysis, Deep ultraviolet

Proceedings Article | 1 October 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Photomasks, Double positive medium, Extreme ultraviolet, Finite-difference time-domain method, Multilayers, Calibration, Critical dimension metrology, Diffraction, Contamination, 3D modeling

Proceedings Article | 20 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Multilayers, Extreme ultraviolet, Double positive medium, Carbon, Transmission electron microscopy, Reflectors, Calibration, Photomasks, Semiconducting wafers, Atomic force microscopy

Proceedings Article | 28 June 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Critical dimension metrology, Data modeling, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Printing, Inspection

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Critical dimension metrology, Inspection, Software development

Proceedings Article | 1 April 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Multilayers, Extreme ultraviolet, Double positive medium, Carbon, Transmission electron microscopy, Photomasks, Reflectors, Calibration, Contamination, Data modeling

Showing 5 of 16 publications
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