Dr. Ying Zhang
at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Author | Editor
Publications (4)

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Statistical analysis, Etching, Scanning electron microscopy, Line width roughness, Line edge roughness, Stochastic processes, Edge roughness

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Electron beams, Etching, Chemical species, Ions, Silicon, Plasma etching, Chlorine, Tellurium, Plasma systems, Plasma

SPIE Conference Volume | April 16, 2013

SPIE Conference Volume | April 16, 2012

Conference Committee Involvement (7)
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning III
24 February 2014 | San Jose, California, United States
Showing 5 of 7 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top