Dr. Ying Zhang
at Applied Materials Inc
SPIE Involvement:
Conference Program Committee | Conference Chair | Author | Editor
Publications (6)

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Nanotechnology, Nanostructures, Optical lithography, Etching, Error analysis, Transistors, Immersion lithography, Current controlled current source

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10149, Advanced Etch Technology for Nanopatterning VI
KEYWORDS: Oxides, Lithography, Metrology, Lithium, Etching, Image processing, Image quality, Digital imaging, 3D metrology, 3D image processing

PROCEEDINGS ARTICLE | March 28, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Signal to noise ratio, Lithography, Optical lithography, Statistical analysis, Etching, Scanning electron microscopy, Line width roughness, Line edge roughness, Stochastic processes, Edge roughness

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Electron beams, Etching, Chemical species, Ions, Silicon, Plasma etching, Chlorine, Tellurium, Plasma systems, Plasma

SPIE Conference Volume | April 16, 2013

SPIE Conference Volume | April 16, 2012

Showing 5 of 6 publications
Conference Committee Involvement (8)
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VI
27 February 2017 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning V
22 February 2016 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning IV
23 February 2015 | San Jose, California, United States
Showing 5 of 8 published special sections
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