Yit Sung Ngo
at National Univ of Singapore
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Ellipsometry, Spectroscopy, Calcium, Polarizers, Photoresist materials, Spectroscopic ellipsometry, Critical dimension metrology, Semiconducting wafers, Temperature metrology, Chemically amplified resists

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Sensors, Spectroscopy, Manufacturing, Resistance, Photoresist materials, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers

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