Yit Sung Ngo
at National Univ of Singapore
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 3 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconducting wafers, Photoresist materials, Spectroscopy, Critical dimension metrology, Spectroscopic ellipsometry, Calcium, Ellipsometry, Temperature metrology, Polarizers, Chemically amplified resists

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Photoresist materials, Lithography, Critical dimension metrology, Spectroscopy, Photoresist processing, Manufacturing, Process control, Sensors, Resistance

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