Yixu Wu
Mask Technology Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

Proceedings Article | 18 March 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Atrial fibrillation, Signal attenuation, Electrons, Distortion, Atomic force microscopy, Scanning electron microscopy, Photoresist materials, Photomasks, Panoramic photography, Semiconducting wafers

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