Dr. Yiyang Jenny Wang
at IBM Corp
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Defect detection, Opacity, Etching, Image processing, Manufacturing, Inspection, Photoresist processing, Yield improvement, Standards development, Defect inspection

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Etching, Image processing, Manufacturing, Photomasks, Mask making, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Yield improvement

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