Yo-Han Choi
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Refractive index, Optical lithography, Inspection, Reflectivity, Chromium, Scatterometry, Transmittance, Photomasks, Critical dimension metrology, Spectrophotometry

Proceedings Article | 5 November 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data storage, Databases, Silver, Manufacturing, Computing systems, Distributed computing, Photomasks, Optical proximity correction, Data conversion, Resolution enhancement technologies

Proceedings Article | 10 May 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Edge detection, Quartz, Image segmentation, Image processing, Inspection, Neural networks, Photomasks, Optical simulations, Artificial intelligence, Neurons

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Error analysis, Fourier transforms, Image acquisition, Photomasks, Convolution, Holmium, Semiconducting wafers, Phase shifts

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Error analysis, Quantitative analysis, Photomasks, Integrated circuits, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beams, Gaussian beams, Modulation, Electrons, Photomasks, Beam shaping, Raster graphics, Mask making, Critical dimension metrology, Vestigial sideband modulation

Showing 5 of 8 publications
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