Mr. Yoav Grauer Profile

Yoav Grauer

Product Marketing Manager at KLA Israel

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Poster + Presentation + Paper

Robustness improvement in imaging based overlay metrology for high topography layers by Talbot targets

Brian Watson, Shlomit Katz, Richard Housley, Kar Wui Thong, Nikhil Aditya Kumar Roy, Yoav Grauer, Diana Shapirov, Raviv Yohanan, Greg Gray, Yonglei Li, Daniel Chalom

Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

KEYWORDS: Metrology, Optical parametric oscillators, Overlay metrology, Imaging metrology, 3D metrology, 3D acquisition

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

High voltage scanning electron microscope overlay metrology accuracy for after development inspection

S. Czerkas, N. Gutman, R. Gronheid, E. Gurevich, R. Wang, Y. Feler, M. Zaberchik, Y. Grauer, H. Stoschus, Y. Uziel, U. Pohlmann, F. Laske

Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

KEYWORDS: Overlay metrology, Scanning electron microscopy, Inspection, Electron microscopes, Optical metrology, Optical lithography, New and emerging technologies, Metrology, Integrated optics, Imaging metrology

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Accuracy enhancement in imaging based overlay metrology by optimizing measurement conditions per layer

Shlomit Katz, Yoav Grauer, Raviv Yohanan, Xiaolei Liu, Daria Negri, Anna Golotsvan

Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

KEYWORDS: Overlay metrology, Computer simulations

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Proceedings Article | 20 March 2020 Paper

Paper

OPO reduction by novel target design

Zephyr Liu, Eitan Hajaj, Ira Naot, Raviv Yohanan, Yoav Grauer

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Metrology, Optical parametric oscillators, Optical design, Overlay metrology, 3D acquisition, 3D metrology, Integrated circuits, Manufacturing, Logic, Process control

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Proceedings Article | 20 March 2020 Paper

Paper

Improved device overlay by litho aberration tracking with novel target design for DRAM

Xiaolei Liu, Eitan Hajaj, Alon Volfman, Hedvi Spielberg, Yoav Grauer, Raviv Yohanan, Xindong Gao

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Overlay metrology, Lithographic illumination, Optical proximity correction, Diffraction gratings

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Proceedings Article | 20 March 2020 Paper

Paper

Machine learning for Tool Induced Shift (TIS) reduction

Shlomit Katz, Boaz Ophir, Udi Shusterman, Anna Golotsvan, Liran Yerushalmi, Efi Megged, Yoav Grauer, Jian Zhang, Alimei Shih, Shi-Ming Wei, Judith Yep, Fiona (Shuk Fan) Leung, Pek Beng Ong

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Semiconducting wafers, Overlay metrology, Machine learning, Metrology, Data modeling, 3D modeling, Performance modeling

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Proceedings Article | 20 March 2020 Presentation + Paper

Presentation + Paper

On product overlay metrology challenges in advanced nodes

Andrei Shchegrov, Philippe Leray, Yuri Paskover, Liran Yerushalmi, Efi Megged, Yoav Grauer, Roel Gronheid

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Optical parametric oscillators, Metrology, Overlay metrology, Logic, Optical alignment, Semiconducting wafers, 3D metrology, Polarization, Extreme ultraviolet, Etching

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Proceedings Article | 20 March 2020 Paper

Paper

OPO residuals improvement with imaging metrology for 3D NAND

Shlomit Katz, Anna Golotsvan, Yoav Grauer, Efi Megged, Greg Gray, Fiona (Shuk Fan) Leung, Pek Beng Ong, Shi Lei, Jeremy (Shi-Ming) Wei, Wayne (Wei) Zhou, Linfei Gao

Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV

KEYWORDS: Overlay metrology, Semiconducting wafers, 3D acquisition, 3D image processing, Imaging metrology, Scanning electron microscopy, Optimization (mathematics), Photovoltaics

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Proceedings Article | 21 October 2016 Presentation + Paper

Presentation + Paper

RGB-NIR active gated imaging

Nick Spooren, Bert Geelen, Klaas Tack, Andy Lambrechts, Murali Jayapala, Ran Ginat, Yaara David, Eyal Levi, Yoav Grauer

Proc. SPIE. 9987, Electro-Optical and Infrared Systems: Technology and Applications XIII

KEYWORDS: Near infrared, Image processing, Vertical cavity surface emitting lasers, Sensors, Optical filters, RGB color model, Objectives, Image fusion, Cameras, Semiconducting wafers

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Proceedings Article | 4 March 2015 Paper

Paper

Active gated imaging for automotive safety applications

Yoav Grauer, Ezri Sonn

Proc. SPIE. 9407, Video Surveillance and Transportation Imaging Applications 2015

KEYWORDS: Imaging systems, Image sensors, Near infrared, Sensors, Cameras, Fiber optic illuminators, Gated imaging, Safety, Night vision, Control systems

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Showing 5 of 10 publications

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