Dr. Yoel Cohen
Head of R&D at AdOM optical technologies Ltd.
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Wafer-level optics, Metrology, Optical properties, Etching, Metals, Silicon, Scatterometry, Critical dimension metrology, Semiconducting wafers, Material characterization

Proceedings Article | 9 April 2008 Paper
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Signal to noise ratio, Calibration, Scanning electron microscopy, Photoresist materials, Scatterometry, Process control, Line edge roughness, Structural design, Scatter measurement, Edge roughness

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Metrology, Error analysis, Photoresist materials, Scatterometry, Time metrology, Process control, Semiconducting wafers, Electromagnetic simulation, Dielectric polarization

Proceedings Article | 16 July 2002 Paper
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Lithography, Diffraction, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Neural networks, Cadmium sulfide, Semiconducting wafers

Proceedings Article | 2 June 2000 Paper
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Wafer-level optics, Oxides, Lithography, Polishing, Reflectivity, Chemical vapor deposition, Photoresist materials, Critical dimension metrology, Semiconducting wafers, Chemical mechanical planarization

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