Dr. Yoh Yamamoto
at Hitachi High-Tech Science Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 June 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Etching, Inspection, Printing, Ion beams, Image transmission, Photomasks, Raster graphics, Photomicroscopy, Semiconducting wafers, Defect inspection

Proceedings Article | 20 August 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Electron beam lithography, Imaging systems, Opacity, Sensors, Etching, Image processing, Silicon, Ion beams, Photomasks, Projection lithography

Proceedings Article | 22 September 1999
Proc. SPIE. 3791, Near-Field Optics: Physics, Devices, and Information Processing
KEYWORDS: Optical fibers, Nanostructures, Light sources, Ultraviolet radiation, Crystals, Near field, Transmittance, Zinc oxide, Nanolithography, Near field optics

Proceedings Article | 22 September 1999
Proc. SPIE. 3791, Near-Field Optics: Physics, Devices, and Information Processing
KEYWORDS: Fabrication, Optical fibers, Metals, Ultraviolet radiation, Zinc, Control systems, Near field, Nanophotonics, Nanolithography, Near field optics

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