Yohan Choi
Principle Module Owner at Photronics Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Electron beam lithography, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Line edge roughness, Semiconducting wafers, Stochastic processes

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Photomasks, Optical proximity correction

Proceedings Article | 16 October 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Metrology, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, SRAF

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Metrology, 3D modeling, Scanning electron microscopy, 3D metrology, Finite element methods, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Yield improvement

Proceedings Article | 5 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Metrology, Manufacturing, 3D modeling, Finite element methods, Photomasks, Optical proximity correction, Mask making, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 26 September 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

Showing 5 of 6 publications
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