Yohei Fujishima
at Nikon Corp
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | March 31, 2014
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Lithography, Reticles, Sensors, Ions, Control systems, Distortion, Printing, Image sensors, Optical scanning, Immersion lithography

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Reticles, Switching, Imaging systems, Water, Deformable mirrors, Distortion, Immersion lithography, Lithographic lenses, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Chromatic aberrations, Refractive index, Mirrors, Optical design, Deep ultraviolet, Scanners, Surface roughness, Wavefronts, Lens design, Combined lens-mirror systems

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