Yoichi Matsuoka
at Canon Inc.
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 12 June 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Particles, Control systems, Solids, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Mask cleaning, Liquids

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Polishing, Curtains, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Liquids

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Lithography, Polishing, Optical lithography, Curtains, Ultraviolet radiation, Particles, Ceramics, Control systems, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers, Surface finishing

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Semiconductors, Lithography, Curtains, Particles, Manufacturing, Image resolution, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Contamination, Deep ultraviolet, Water, Particles, Inspection, Bridges, Scanning probe microscopy, Semiconducting wafers, Liquids, Defect inspection

Showing 5 of 7 publications
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