Mr. Yoichiro Takahashi Profile

Yoichiro Takahashi

at NuFlare Technology Inc

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 20 August 2004 Paper

257-nm wavelength mask inspection for 65-nm node reticles

Ryoji Yoshikawa, Hiroyuki Tanizaki, Tomohide Watanabe, Hiromu Inoue, Riki Ogawa, Satoshi Endo, Masami Ikeda, Yoichiro Takahashi, Hidehiro Watanabe

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557725

KEYWORDS: Inspection, Sensors, Photomasks, Image sensors, Reticles, Light sources, Point spread functions, Image processing, Computer aided design, Phase shifting

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years