Dr. Yong-Dong Wang
Senior Manager at Synopsys Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Logic, Lithium, Manufacturing, Electroluminescence, Data processing, Photomasks, Computed tomography, Optical proximity correction, Electronic design automation

PROCEEDINGS ARTICLE | October 31, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Optical components, Atrial fibrillation, Image processing, Image resolution, Photomasks, Optical proximity correction, System on a chip, Systems modeling, Model-based design, Process modeling

PROCEEDINGS ARTICLE | January 27, 2005
Proc. SPIE. 5645, Advanced Microlithography Technologies
KEYWORDS: Lithography, Reticles, Silicon, Bridges, Design for manufacturing, Photomasks, Optical proximity correction, Semiconducting wafers, Process modeling, Resolution enhancement technologies

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Optical lithography, Data modeling, Etching, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Model-based design, Resolution enhancement technologies

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top